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The process flow simulation of the cathode-grid system and its emission properties |
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Authors |
| Djuzhev N.A. |
| Makhiboroda M.A. |
| Gusev Ye. |
| Gryazneva T. |
| Demin G.D. |
Date of publication |
| 2016 |
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Abstract |
| In work the results TCAD simulation software package process of creating a cathode-grid system (CGS), which consists of a field emission cathode, and grid control electrodes. Presented by process of forming and sharpening needle cathode based on a standard silicon wafer processing technologies group. The proposed process route allows the dissection areas in the self-alignment of emitter layer grid operations without costly photolithography or chemical-mechanical polishing. On the basis of structure CGS in TCAD using means of COMSOL Multiphysics performed calculation of current-voltage characteristics of a field emission triode, which are in good agreement with experimental measurements in field emission triode obtained by specially designed for this purpose the measuring stand. |
Keywords |
| field emission, cathode-grid system, vacuum integrated circuit, current density, TCAD |
Library reference |
| Djuzhev N.A., Makhiboroda M.A., Gusev Ye., Gryazneva T., Demin G.D. The process flow simulation of the cathode-grid system and its emission properties // Problems of Perspective Micro- and Nanoelectronic Systems Development - 2016. Proceedings / edited by A. Stempkovsky, Moscow, IPPM RAS, 2016. Part 4. P. 37-42. |
URL of paper |
| http://www.mes-conference.ru/data/year2016/pdf/D159.pdf |
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