| Carbon nanostructures plasma-catalytic growth technology: features and field emission circuits’ application |
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| Authors |
| | Petruhin G.N. |
| Date of publication |
| | 2010 |
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| Abstract |
| | Features of carbon nanostructures’ PECCVD growth technology are presented in this work. Here is shown the ability of controlled growth of defined type carbon nanostructures by means of direct field value variation, which is applied normally to the substrate’s surface. Comparative analysis of carbon nanostructures’ field emission properties is presented. Results of the presented technology application in hybrid and planar circuits are discussed. Here is noted that PECCVD method have some problems on application in planar circuits’ fabrication. |
| Keywords |
| | carbon nanostructures, field emission |
| Library reference |
| | Petruhin G.N. Carbon nanostructures plasma-catalytic growth technology: features and field emission circuits’ application // Problems of Perspective Micro- and Nanoelectronic Systems Development - 2010. Proceedings / edited by A. Stempkovsky, Moscow, IPPM RAS, 2010. P. 632-637. |
| URL of paper |
| | http://www.mes-conference.ru/data/year2010/papers/m10-323-27281.pdf |
