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| End-to-end technology/device/circuit/system statistical design |
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| Authors |
| | Belous A.I. |
| | Krasikov M.G. |
| | Kuleshov A.A. |
| | Nelayev V.V. |
| | Stempitsky V.R. |
| | Syakersky V.S. |
| Date of publication |
| | 2008 |
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| Abstract |
| | The methodology the end-to-end statistical analysis and optimization of the technology/device/circuit/system was presented. Design at nominal values of input parameters for each of these steps is performed using standard software. Statistical analysis in a series of Monte-Carlo simulation to study the effect of fluctuations of input parameters on output characteristics at every stage of design process by using the residual curves obtained with usage of the response surface methodology. On the simple example of a inverter cell design formed on the basis of the MOS transistor it is investigated performance of the proposed approach to addressing end-to-end statistical design. |
| Keywords |
| | statistical analysis, optimization, computer aided design, IC technology, parameters fluctuations |
| Library reference |
| | Belous A.I., Krasikov M.G., Kuleshov A.A., Nelayev V.V., Stempitsky V.R., Syakersky V.S. End-to-end technology/device/circuit/system statistical design // Problems of Perspective Micro- and Nanoelectronic Systems Development - 2008. Proceedings / edited by A. Stempkovsky, Moscow, IPPM RAS, 2008. P. 173-178. |
| URL of paper |
| | http://www.mes-conference.ru/data/year2008/29.pdf |
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